Properties of the MTO/Ag/MTO/PET Multilayer Film as a function of MTO Thickness
Sangmoo Yoon, Guneik Jang
Depart of Materials Engineering, Chungbuk National University, Cheongju, 362-763, Korea
E-mail:
Abstract: A hybrid structure of TCO films based on Mn(2.59 wt.%) doped SnO
2
(MTO) on
flexible substrate were deposited by DC/RF magnetron sputtering and its optical and
electrical properties were systematically investigated as a function of MTO thickness. Prior to
experiment, Essential Macleod Program(EMP) was adopted to expect the characteristics of
multilayer film, and practical deposition of multilayer films was conducted in MTO(40 – 80
nm)/Ag(10 nm)/MTO(40 – 80 nm) thickness range. The highest transmittance of multilayer
film was about 86% at 550 nm wavelength in MTO(70 nm)/Ag(10 nm)/MTO(70 nm). Sheet
resistance(Rs) of multilayer films was almost constant, due to the silver layer. The lowest
sheet resistance was exhibited in 7.7 Ω/sq. However, the resistivity of the multilayer film
increased simultaneously with increasing thickness of MTO layer from 40 to 80 nm. The
calculated Figure of merit(Φ
TC
) value of multilayer film was 28.7 × 10
-3
· Ω
-1
at a MTO
thickness of 70 nm.
Keywords: Mn doped SnO
2
, EMP Simulation, transmittance, sheet resistance, figure of merit,
PS2 21
-215-
